Three-dimensional optical confinement in II-VI pillar microcavities
Year: 2002
Authors: Gurioli M., Bogani F., Wiersma D.S., Roussignol Ph., Cassabois G., Khitrova G., Gibbs H.
Autors Affiliation: Istituto Nazionale di Fisica della Materia, Dipartimento di Scienza dei Materiali, Università Milano Bicocca, Via Cozzi 53, 20125 Milano, Italy; Istituto Nazionale di Fisica della Materia, Dipartimento di Energetica, Università di Firenze, Via Santa Marta 3, 50134 Firenze, Italy; Istituto Nazionale di Fisica della Materia, Laboratorio Europeo di Spettroscopia Non Lineare, Università di Firenze, Largo E. Fermi 2, 50125 Firenze, Italy; Laboratoire de Physique de la Matière Condensée de l\’Ecole Normale Supérieure, 24 rue Lhomond, 75231 Paris Cedex 05, France; Optical Sciences Center, University of Arizona, Tucson, AZ 85721, United States
Abstract: We have fabricated CdMgTe/CdMnTe based pillar microcavities with diameters down to 2 µm by optical lithography and reactive ion etching. Three-dimensional optical confinement is demonstrated by the occurrence of higher lateral modes. In the high excitation regime, the emission line-width in pillar microcavities is found to be significantly reduced as compared to planar microcavities.
Journal/Review: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume: 190 (2) Pages from: 357 to: 361
KeyWords: Electromagnetic fields; Mirrors; Photolithography; Reactive ion etching; Semiconducting cadmium telluride; Semiconductor quantum wells, Semiconductor microcavities; Three-dimensional optical confinement, Cavity resonatorsDOI: