Photobleaching of polydiacetylene waveguides: A characterization of the process and patterning of optical elements

Year: 1997

Authors: Palchetti L., Li Q., Giorgetti E., Grando D., Sottini S.

Autors Affiliation: Istituto di Ricerca sulle Onde Elettromagnetiche, Consiglio Nazionale delle Ricerche, Via Panciatichi 64, Firenze, Italy; Shanghai Jiao Tong University, 1945 Huan Shan Road, Shanghai, 200030, China; Politecnico de Bari, Via Orabona 4, Bari, Italy

Abstract: The photobleaching process of poly-3butoxyl-carbonyl-methyl-urethane (poly-3BCMU) waveguides by means of an UV lamp and the 488-nm line of an Ar laser is characterized and modeled. The limits of the theory are discussed in light of experimental results, and we stress the role of the oxygen diffusion rate on the process. Finally, we adopt the photobleaching method to pattern a guided-wave micro-optic device and holographic diffraction gratings on spun poly-3BCMU films.

Journal/Review: APPLIED OPTICS

Volume: 36 (6)      Pages from: 1204  to: 1212

KeyWords: Integrated optics; Nonlinear optics; Photobleaching; Polymer waveguides
DOI: 10.1364/AO.36.001204