The contributions of junctions and nanowires/nanotubes in conductive networks
Authors: Ponzoni A.
Autors Affiliation: National Institute of Optics of the National Research Council (CNR-INO), Unit of Brescia, Via Branze 45, 25123 Brescia, Italy
Abstract: Electrical transport in networked materials occurs through percolative clusters composed of a random distribution of two kinds of interconnected elements: elementary nanostructures and nanostructure-nanostructure junctions. Rationalizing the contribution of these microscopic elements to the macroscopic resistance of the system is a fundamental issue to develop this class of materials and related devices. Focusing on networks composed of high-aspect-ratio nanostructures, such as nanowires (NWs) or nanotubes (NTs), these concepts are still raising controversy in modeling and interpretation of experimental data. Despite these incongruences and the large variations induced by disorder in the electrical properties of such networked systems, this work shows that the ratio between the junction and the nanostructure resistance is nearly the same at the microscopic and macroscopic levels, regardless of the network features. In other words, this means that we may assess the relative contribution of nanostructures and junctions to the macroscopic network resistance directly from the knowledge of its microscopic building blocks. Based on experimental data available in the literature, this result is proven to hold for different materials and network densities, ranging from inorganic NWs to organic carbon NTs and from the percolation critical density nc up to, at least, five times nc, respectively.
Journal/Review: APPLIED PHYSICS LETTERS
Volume: 114 (15) Pages from: 153105-1 to: 153105-5
KeyWords: Percolation; Nanowires; Electrical propoerties; Carbon nanotubesDOI: 10.1063/1.5090117Citations: 11data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2021-12-05References taken from IsiWeb of Knowledge: (subscribers only)Connecting to view paper tab on IsiWeb: Click hereConnecting to view citations from IsiWeb: Click here