Patterning nonanethiol protected gold films by barium atoms
Anno: 2004
Autori: Camposeo A., Fioretti A., Tantussi F., Gozzini S., Arimondo E., Gabbanini C.
Affiliazione autori: INFM, Dipartimento di Fisica E. Fermi, Università di Pisa, Via F. Buonarroti 2, 56127 Pisa, Italy; Istituto per i Processi Chimico-Fisici del C.N.R., via Moruzzi 1, 56124, Pisa, Italy
Abstract: Self assembled monolayers (SAM) formed from nonanethiols on thin gold films were exposed to a beam of ground state and metastable neutral barium atoms through a nickel mask. The interaction of the Ba atoms with the nonanethiol layer, followed by an etching process, creates well defined structures on the gold film, with features below 100 nm. We compared the interaction of ground state Ba atoms and SAM molecules with respect to metastable Ba atoms, finding that by using metastable atoms the Ba dose per SAM molecule is reduced. The results indicate that nanofabrication in the nanometer range with barium atoms is feasible.
Giornale/Rivista: APPLIED PHYSICS B-LASERS AND OPTICS
Volume: 79 (5) Da Pagina: 539 A: 543
Parole chiavi: laser; nanolithography; DOI: 10.1007/s00340-004-1625-0Citazioni: 6dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2024-04-14Riferimenti tratti da Isi Web of Knowledge: (solo abbonati) Link per visualizzare la scheda su IsiWeb: Clicca quiLink per visualizzare la citazioni su IsiWeb: Clicca qui