Pattern stabilization through parameter alternation in a nonlinear optical system
Anno: 2006
Autori: Sharpe J.P., Ramazza PL., Sungar N., Saunders K.
Affiliazione autori: Calif Polytech State Univ San Luis Obispo, Dept Phys, San Luis Obispo, CA 93407 USA; Ist Nazl Ottica, I-50125 Florence, Italy
Abstract: We report the first experimental realization of pattern formation in a spatially extended nonlinear system when the system is alternated between two states, neither of which exhibits patterning. Dynamical equations modeling the system are used for both numerical simulations and a weakly nonlinear analysis of the patterned states. The simulations show excellent agreement with the experiment. The nonlinear analysis provides an explanation of the patterning under alternation and accurately predicts both the observed dependence of the patterning on the frequency of alternation and the measured spatial frequencies of the patterns.
Giornale/Rivista: PHYSICAL REVIEW LETTERS
Volume: 96 (9) Da Pagina: 094101 A: 094101
Parole chiavi: FEEDBACKDOI: 10.1103/PhysRevLett.96.094101Citazioni: 14dati da “WEB OF SCIENCE” (of Thomson Reuters) aggiornati al: 2024-05-12Riferimenti tratti da Isi Web of Knowledge: (solo abbonati) Link per visualizzare la scheda su IsiWeb: Clicca quiLink per visualizzare la citazioni su IsiWeb: Clicca qui